RealOne™ Player software is required to run the .rm files in this section.
This section includes audio lectures that were recorded specifically for OpenCourseWare. Lectures are presented by topic, and not necessarily by date.
These files are also available on iTunes®.
Lecture files.
| Lec # |
TOPICS |
AUDIO |
| 1 |
Introduction to 6.774
CMOS Process Flow |
|
| 2 |
Crystal Growth, Wafer Fabrication, and Basic Properties of Si Wafers |
|
| 3 |
Crystal Growth, Wafer Fabrication, and Basic Properties of Si Wafers (cont.)
Wafer Cleaning and Gettering |
(RM - 16K) |
| 4 |
Wafer Cleaning and Gettering (cont.) |
(RM - 16K) |
| 5 |
Wafer Cleaning and Gettering - Contamination Measurement Techniques
Oxidation and the Si/SiO2 Interface - Uses of Oxides and CV Measurement Techniques |
(RM - 16K) |
| 6 |
Oxidation and the Si/SiO2 Interface: Deal/Grove Model, Thin Oxide Models |
(RM - 16K) |
| 7 |
Oxidation and the Si/SiO2 Interface: 2D Effects, Doping Effects, Point Defects |
(RM - 16K) |
| 8 |
Dopant Diffusion - Need for Abrupt Profiles, Fick's Laws, Simple Analytic |
(RM - 16K) |
| 9 |
Dopant Diffusion - Numerical Techniques in Diffusion, E Field Effects |
(RM - 16K) |
| 10 |
Dopant Diffusion - Fermi Level Effects, I and V Assisted Diffusion |
(RM - 16K) |
| 11 |
Dopant Diffusion - Review Atomic Scale Models, Profile Measurement Techniques |
(RM - 16K) |
| 12 |
Ion Implantation and Annealing - Analytic Models and Monte Carlo |
(RM - 16K) |
| 13 |
Ion Implantation and Annealing - Physics of E Loss, Damage, Introduction to TED |
(RM - 16K) |
| 14 |
Transient Enhanced Diffusion (TED) - +1 Model, (311) Defects and TED Introduction |
(RM - 16K) |
| 15 |
Transient Enhanced Diffusion (TED) - Simulation Examples, TED Calculations, RSCE in detail |
(RM - 16K) |
| 16 |
The SUPREM IV Process Simulator |
(RM - 16K) |
| 17 |
Thin Film Deposition and Epitaxy - Introduction to CVD, Si Epitaxial Growth |
(RM - 16K) |
| 18 |
Thin Film Deposition and Epitaxy - CVD Examples and PVD |
(RM - 16K) |
| 19 |
Thin Film Deposition and Epitaxy - Modeling Topography of Deposition |
(RM - 16K) |
| 20 |
Etching - Introduction |
(RM - 16K) |
| 21 |
Etching - Poly Gate Etching, Stringers, Modeling of Etching |
(RM - 16K) |
| 22 |
Silicides, Device Contacts, Novel Gate Materials |
(RM - 16K) |
| 23 |
Growth and Processing of Strained Si/SiGe and Stress Effects on Devices |
(RM - 16K) |
| 24-26 |
Report Presentations |
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