Submicrometer and Nanometer Technology

A nanofabricated electron-beam lithograph.

Bryan Cord nanofabricated this pattern that illustrates the exquisite resolution possible using electron-beam lithography. The principles required to perform this fabrication are described and explained in this course. (Image courtesy of Bryan Cord of the MIT Quantum Nanostructures and Nanofabrication Group.)

Instructor(s)

MIT Course Number

6.781J / 2.391J

As Taught In

Spring 2006

Level

Graduate

Translated Versions

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Cite This Course

Course Features

Course Description

This course surveys techniques to fabricate and analyze submicron and nanometer structures, with applications. Optical and electron microscopy is reviewed. Additional topics that are covered include: surface characterization, preparation, and measurement techniques, resist technology, optical projection, interferometric, X-ray, ion, and electron lithography; Aqueous, ion, and plasma etching techniques; lift-off and electroplating; and ion implantation. Applications in microelectronics, microphotonics, information storage, and nanotechnology will also be explored.

Acknowledgements

The Instructors would like to thank Bob Barsotti, Bryan Cord, and Ben Wunsch for their work on the Atomic Force Microscope video. They would also like to thank Bryan Cord for creating each video.

Barbastathis, George, Henry Smith, and Karl Berggren. 6.781J Submicrometer and Nanometer Technology, Spring 2006. (MIT OpenCourseWare: Massachusetts Institute of Technology), http://ocw.mit.edu/courses/electrical-engineering-and-computer-science/6-781j-submicrometer-and-nanometer-technology-spring-2006 (Accessed). License: Creative Commons BY-NC-SA


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