PK yQP2ʙ ʙ imsmanifest.xml
IMS Content
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Submicrometer and Nanometer Technology
OCW Master Course Number
6.781J
OCW Linked Course Number
2.391J
Spring 2006
OCW_LOMv1.0
Author
Barbastathis, George
2020-12-27
OCW_LOMv1.0
Author
Smith, Henry
2020-12-27
OCW_LOMv1.0
Author
Berggren, Karl
2020-12-27
OCW_LOMv1.0
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URI
http://www.core.org.cn/OcwWeb/Electrical-Engineering-and-Computer-Science/6-781JSpring-2006/CourseHome/index.htm
OCW Course Topics
Engineering
Nanotechnology
OCW Course Topics
Engineering
Mechanical Engineering
Microtechnology
OCW Course Topics
Engineering
Electrical Engineering
contents/index.htm.xml
Submicrometer and Nanometer Technology
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Submicrometer and Nanometer Technology
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6-781js06.jpg
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6-781js06-th.jpg
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Syllabus
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Readings
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Assignments
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pset_01.pdf
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pset_09.pdf
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pset_13.pdf
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pset_11.pdf
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final.pdf
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pset_06.pdf
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pset_03.pdf
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pset_04.pdf
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pset_10.pdf
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pset_02.pdf
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pset_07.pdf
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pset_12b.pdf
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pset_08.pdf
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pset_05.pdf
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pset_12a.pdf
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Videos
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Legal Notices
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Privacy Statement
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Trademark Notices
contents/assignments/pset_10.pdf.xml
contents/assignments/pset_07.pdf.xml
contents/readings/index.htm.xml
contents/assignments/pset_03.pdf.xml
contents/assignments/pset_01.pdf.xml
contents/assignments/pset_05.pdf.xml
contents/6-781js06-th.jpg.xml
contents/assignments/index.htm.xml
contents/assignments/pset_02.pdf.xml
contents/assignments/pset_09.pdf.xml
contents/assignments/pset_12a.pdf.xml
contents/assignments/pset_13.pdf.xml
contents/6-781js06.jpg.xml
contents/index.htm.xml
contents/assignments/pset_12b.pdf.xml
contents/videos/index.htm.xml
contents/assignments/pset_08.pdf.xml
contents/syllabus/index.htm.xml
contents/assignments/final.pdf.xml
contents/assignments/pset_06.pdf.xml
contents/assignments/pset_11.pdf.xml
contents/assignments/pset_04.pdf.xml
PK Q~3! 6-781j-spring-2006/ReadMe.txtThis zip package contains the HTML pages and files associated with the course.
Some materials - such as videos, java applets, and other special content - are not posted on the OCW server, and are therefore not part of this package. This prevents zip packages from becoming too large for download. To download these resources to your computer, please read the FAQ at https://ocw.mit.edu/help/faq-technology/ .
Use of the materials in this package are governed by the same Creative Commons license as all other materials published on MIT OpenCourseWare. For more information, see https://ocw.mit.edu/terms .
If you have any trouble using this package, please contact us at ocw@mit.edu .PK Q%aD6 6 6-781j-spring-2006/START.htm
MIT OpenCourseWare | Welcome
Welcome to MIT Open Course Ware. You will be automatically redirected to Home. If you aren not forwarded to the new page, Click here to access the home page of the downloaded Click Here
PK yQn3 3 - 6-781j-spring-2006/contents/6-781js06.jpg.xml
6-781js06.jpg
Bryan Cord nanofabricated this pattern that illustrates the exquisite resolution possible using electron-beam lithography. The principles required to perform this fabrication are described and explained in this course. (Image courtesy of Bryan Cord of the MIT Quantum Nanostructures and Nanofabrication Group.)
en
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Spring 2006
OCW_LOMv1.0
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Barbastathis, George
2020-12-27
OCW_LOMv1.0
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Smith, Henry
2020-12-27
OCW_LOMv1.0
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Berggren, Karl
2020-12-27
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This site (c) Massachusetts Institute of Technology 2020. Content within individual courses is (c) by the individual authors unless otherwise noted. The Massachusetts Institute of Technology is providing this Work (as defined below) under the terms of this Creative Commons public license ("CCPL" or "license") unless otherwise noted. The Work is protected by copyright and/or other applicable law. Any use of the work other than as authorized under this license is prohibited. By exercising any of the rights to the Work provided here, You (as defined below) accept and agree to be bound by the terms of this license. The Licensor, the Massachusetts Institute of Technology, grants You the rights contained here in consideration of Your acceptance of such terms and conditions.
LOMv1.0
ispartof
OCW Master Course Number
6.781J Submicrometer and Nanometer Technology Spring 2006
This course surveys techniques to fabricate and analyze submicron and nanometer structures, with applications. Optical and electron microscopy is reviewed. Additional topics that are covered include: surface characterization, preparation, and measurement techniques, resist technology, optical projection, interferometric, X-ray, ion, and electron lithography; Aqueous, ion, and plasma etching techniques; lift-off and electroplating; and ion implantation. Applications in microelectronics, microphotonics, information storage, and nanotechnology will also be explored.AcknowledgementsThe Instructors would like to thank Bob Barsotti, Bryan Cord, and Ben Wunsch for their work on the Atomic Force Microscope video. They would also like to thank Bryan Cord for creating each video.
submicron and nanometer structures
optical and electron microscopy
Surface characterization
preparation
and measurement techniques
Resist technology
optical projection
interferometric
X-ray
ion
and electron lithography
Aqueous
ion
and plasma etching techniques
Lift-off and electroplating
Ion implantation
microelectronics
microphotonics
information storage
and nanotechnology
PK yQ(`x_3 3 ) 6-781j-spring-2006/contents/index.htm.xml
Submicrometer and Nanometer Technology
This course surveys techniques to fabricate and analyze submicron and nanometer structures, with applications. Optical and electron microscopy is reviewed. Additional topics that are covered include: surface characterization, preparation, and measurement techniques, resist technology, optical projection, interferometric, X-ray, ion, and electron lithography; Aqueous, ion, and plasma etching techniques; lift-off and electroplating; and ion implantation. Applications in microelectronics, microphotonics, information storage, and nanotechnology will also be explored.AcknowledgementsThe Instructors would like to thank Bob Barsotti, Bryan Cord, and Ben Wunsch for their work on the Atomic Force Microscope video. They would also like to thank Bryan Cord for creating each video.
OCW Master Course Number
6.781J
OCW Linked Course Number
2.391J
en
LOMv1.0
4
Spring 2006
OCW_LOMv1.0
Author
Barbastathis, George
2020-12-27
OCW_LOMv1.0
Author
Smith, Henry
2020-12-27
OCW_LOMv1.0
Author
Berggren, Karl
2020-12-27
2006/11/08 16:48:53 US/Eastern
2015/02/13 08:03:15.086 US/Eastern
/courses/electrical-engineering-and-computer-science/6-781j-submicrometer-and-nanometer-technology-spring-2006/index.htm
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LOMv1.0
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38.0
LOMv1.0
Browser
LOMv1.0
Internet Explorer
9.0
LOMv1.0
Browser
LOMv1.0
Edge
13.1
OCW_LOMv1.0
Graduate
LOMv1.0
yes
This site (c) Massachusetts Institute of Technology 2020. Content within individual courses is (c) by the individual authors unless otherwise noted. The Massachusetts Institute of Technology is providing this Work (as defined below) under the terms of this Creative Commons public license ("CCPL" or "license") unless otherwise noted. The Work is protected by copyright and/or other applicable law. Any use of the work other than as authorized under this license is prohibited. By exercising any of the rights to the Work provided here, You (as defined below) accept and agree to be bound by the terms of this license. The Licensor, the Massachusetts Institute of Technology, grants You the rights contained here in consideration of Your acceptance of such terms and conditions.
LOMv1.0
hasversion
URI
http://www.core.org.cn/OcwWeb/Electrical-Engineering-and-Computer-Science/6-781JSpring-2006/CourseHome/index.htm
submicron and nanometer structures
optical and electron microscopy
Surface characterization
preparation
and measurement techniques
Resist technology
optical projection
interferometric
X-ray
ion
and electron lithography
Aqueous
ion
and plasma etching techniques
Lift-off and electroplating
Ion implantation
microelectronics
microphotonics
information storage
and nanotechnology
PK yQsB] ] , 6-781j-spring-2006/contents/6-781js06-th.jpg Exif II* Ducky <