Problem Set 1 (PDF)
Problem Set 2 (PDF)
Problem Set 3 (PDF)
Problem Set 4 (PDF)
Problem Set 5 (PDF)
Problem Set 6 (PDF)
Problem Set 7 (PDF)
Problem Set 8 (PDF)
Problem Set 9 (PDF)
Problem Set 10 (PDF)
Problem Set 11 (PDF)
Problem Set 12a (PDF)
Problem Set 12b (PDF)
Problem Set 13 (PDF)
Final Assignment (PDF)
Readings for Final Assignment
In order to complete the final assignment, you will need to read the papers listed below. Please refer to the assignment for specific details.
Cord, B., C. Dames, K. K. Berggren, and J. Aumentado. “Robust Shadow-Mask Evaporation via Lithographically-Controlled Undercut.” Microsystems Technology Research Report. Massachusetts Institute of Technology (September 2006).
Giapis, Konstantinos, Geoffrey Scheller, Richard Gottscho, William Hobson, and Yong Lee. “Microscopic and Macroscopic Uniformity Control in Plasma Etching.” Applied Physics Letter 57, no. 983 (1990).
Yu, Z., et al. “Fabrication of Large Area Subwavelength Antireflection Structures on Si using Trilayer Resist Nanoimprint Lithography and Lift-off.” Journal of Vaccum Science and Technology B 21 (2003): 2874-2877.
Chao, D., A. Patel, T. Barwicz, H. I. Smith, and R. Menon. “Immersion Zone-plate-array Lithography.” Journal of Vaccum Science and Technology B 23, no. 6 (2005): 2657-2661.
Fritze, M., et al. “Hybrid Optical Maskless Lithography: Scaling Beyond the 45 nm Node.” Journal of Vacuum Science and Technology B 23, no. 6 (November/December 2005): 2743.
Austin, M. D., H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S. A. Lyon, and S. Y. Chou. “Fabrication of 5 nm Linewidth and 14 nm Pitch Features by Nanoimprint Lithography.” Applied Physics Letter 84 (2004): 5299-301.
Hua, F., Y. G. Sun, A. Gaur, M. A. Meitl, L. Bilhaut, L. Rotkina, J. F. Wang, P. Geil, M. Shim, J. A. Rogers, and A. Shim. “Polymer Imprint Lithography with Molecular-scale Resolution.” Nano Letter 4 (2004): 2467-2471.
